Junkosha launches self-supporting cable solution for atmospheric pressure stages within semiconductor manufacturing environments
Pioneer of sophisticated fluoropolymer application technologies introduces new self-supporting Flat and High-Flex Cable at SEMICON West 2025; eliminates guides to reduce weight, minimize particle generation and save space

Low Particulation Cable – Self-Supporting
Fluoropolymer Type
SEMICON West Booth 356
October 6th, 2025 - Junkosha, a pioneer in advanced cable solutions for semiconductor manufacturing equipment, has chosen this year’s SEMICON West event to announce the launch of its new self-supporting Flat and High-Flex Cable designed to meet the increasing pressure on manufacturers and their engineers to maximize performance from the existing labyrinth of chip standards and cleanroom processing. By eliminating the need for cable guides, this innovation reduces particle generation in demanding cleanroom environments, saves space, reduces weight and improves precision positioning accuracy in linear stage systems; offering manufacturers design flexibility in their drive for higher yields and efficiency.
In high-performance systems, cable management plays a decisive role in reliability, cable density and operational longevity. Traditional cable guides not only consume valuable space as manufacturers are limited in how much smaller transistors can be shrunk but also creates wear that generates dust and particles in sensitive cleanroom environments. Junkosha’s self-supporting cable solution directly addresses these concerns by delivering higher cable density per layer, achieving long-term reliability and precise movement control in the atmospheric stages of semiconductor manufacturing.
Leveraging patented narrow-pitch and minimized webbing design enables more cable cores per layer while maintaining stable motion, high durability, and support for strokes up to 1.5 meters. For instance, by offering two layers where conventional technologies require three, this solution delivers space efficiency, reduced weight and maintenance efficiency, aligning with customer preferences for fewer layers and narrower widths which are critical in equipment where every millimeter counts.
“Our new cable is designed for use in the atmospheric pressure stage of semiconductor manufacturing equipment, including defect review and planarization processes carried out in non-vacuum environments,” explains Shinsuke Kitazawa, Product Manager at Junkosha. “This focus enables manufacturers to benefit from a solution optimized for some of the most particle-sensitive areas of semiconductor manufacturing process.”
Undergoing extensive testing, Junkosha’s new self-supporting cable has already surpassed 27 million cycles which is more than double the benchmark of competing products. This is made possible thanks to Junkosha’s advanced processed porous PTFE composite jacket for the outer sheath, meaning the cable provides improved lifespan compared to existing solutions, therefore enhancing durability while maintaining flexibility. This material choice delivers robust performance in the demanding conditions of semiconductor manufacturing, where both cleanliness and mechanical reliability are non-negotiable.
With particle generation directly linked to manufacturing yield, Junkosha’s self-supporting cable contributes to reduced contamination risk and higher process reliability. Combined with its space and weight savings, the solution drives improvements in total cost of ownership (TCO) for semiconductor manufacturers operating in increasingly competitive markets. As circuit geometries continue to shrink, the importance of particle control grows ever greater. By addressing both cleanliness and process efficiency, Junkosha Flat and High-Flex Cable supports semiconductor manufacturers at the forefront of chip miniaturization.
Junkosha will be exhibiting its Flat and High-Flex Low Particulation Cable (Self-Supporting) at the SEMICON West exhibition from October 7-9. More information on Junkosha’s range of semiconductor solutions can be found here.